The PVD coating system for mass production using the round arc source and large area rectangular arc source. This system can be converted into hybrid coating system by install the additional magnetron sources, and it is used for wear resistant coatings for such as different cutting tools, punch, mold and machine parts.

	The high rate in-line magnetron sputtering system for a replacement for electroplated coating with 6 large area rectangular sources. It is consisted of four chambers for loading, plasma cleaning, coating and unloading. Automatic gas controller is installed and full automatic operation is available by means of PLC.

	The R&D system that can be installed 4 magnetron sources. Jig's revolution and rotation is possible, and pneumatic target shutter and gas controller is installed. It is used for the property analysis and evaluation of the magnetron profile as well as development of reactive magnetron sputtering process and multi-layer thin film.

	The magnetron sputtering system that has one large area rectangular magnetron source and automatic reciprocating jig. It is used for development of reactive magnetron sputtering process, new magnetron source and advanced functional metalization process.

	The magnetron sputtering system that can be install 4 external sources on the chamber side and 2 internal sources on the top. Automatic operation is available by means of auto-gas controller, pneumatic target shutter and PLC. It is used for development of Multi-layer thin film and reactive magnetron sputtering process.